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Abstract
The types of thin film deposition techniques and their differences are presented in this article. The characteristics of magnetron sputtering techniques are thoroughly observed. A review of recent research efforts and developments for the fabrication of semiconductor resistive gas sensors using magnetron sputtering deposition methods, presenting its potential advantages as a materials synthesis technique for gas sensors along with a discussion of their sensing performance are also presented. It can be argued that these advantages are likely to drive increased interest in the use of magnetron sputtering techniques for gas sensor materials over the next decade as the advanced physical vapor deposition (PVD) method.
