2017; Physical and Mathematical Sciences, 51(3 (244): 269–274
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INVESTIGATION OF LOCALIZED ELECTROMAGNETIC FIELD IN A SUBWAVELENGTH METALLIC SLIT

Shant Araqelyan*

Received: 2025-02-05 · Published: 2017-12-15

© 2017 The Author(s) and the original publisher.

CC BY-NC 4.0 This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.
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Original title
INVESTIGATION OF LOCALIZED ELECTROMAGNETIC FIELD IN A SUBWAVELENGTH METALLIC SLIT
Author
Shant Araqelyan
Published
2017-12-15
Licence
Creative Commons Attribution-NonCommercial 4.0 International
Original
https://doi.org/10.46991/PYSU:A/2017.51.3.269

Abstract

Electromagnetic field localization in a subwavelength metallic slit by a thermo-elastic optical indicator microscope (TEOIM) was investigated. As an indicator for the TEOIM system a slide glass with sizes of 20×20×0.5 (mm) was used, on the surface of which an Al film of 20 nm thickness was vaporized using the vacuum evaporation technique, with various slit width (10−50 μm).  Strongly localized electromagnetic field has been exited in the slits by 50 GHz generator and was visualized by a TEOIM. The waveguide properties of  the system were characterized by COMSOL Multiphysics® additionally. The simulation results are in good agreement with the visualization data set.
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